No way. 1. Taking the current most advanced 28nm chip process as an example, the exposure resolution of the lithography machine needs to reach below 40nm, and the resolution of the 90nm process is far from this level, and can not meet the process requirements of the 28nm chip. 2. In the development of the chip process, each process leap often requires corresponding technological breakthroughs and innovations, from the 90nm process to the 28nm process needs to go through many technical optimization and iteration, so it is impossible to directly use the 90nm lithography machine to produce 28nm chips. Chip manufacturing is a very rigorous and fine process, despite the continuous progress of science and technology, but there is still a big gap between different process levels and equipment capabilities, which is insurmountable.
2 Because the process size gap between 90nm and 28nm is relatively large, 90nm lithography machines can not meet the process requirements of 28nm chips.
There are two main reasons: First, the minimum exposure accuracy of 90nm lithography machine reaches about 100nm, which cannot meet the exposure accuracy requirements of 28nm chip; Second, the imaging resolution of 90nm lithography machine is not enough, and the minimum line width required for 28nm chips has been reduced to less than 40nm.
3 If you need to produce 28nm chips, you need to use more advanced lithography machines, such as 40nm or smaller sizes.
At the same time, more advanced processes and materials are needed to achieve 28nm chip production.
2 Because the minimum processing size of the 90nm lithography machine is only 90nm, and the line width of the 28nm chip is 28nm, the 90nm lithography machine cannot meet the requirements of the production of 28nm chips.
3 If you want to produce 28nm chips, you need to use a lithography machine with a minimum processing size of 28nm or more advanced process equipment to manufacture.
As the name suggests, the 90nm lithography machine can only produce chips above 90nm, and can not produce 28nm chips.
Because the smaller the nm number of the chip, the higher the technical requirements, the higher the precision requirements. Therefore, at present, TSMC's 3nm chip is the most powerful chip.
No.
1, the lithography machine is a very important equipment in the semiconductor process, the production of 28nm chip needs higher resolution and more precise processing process than 90nm, and the resolution and processing process of 90nm lithography machine can not meet the production requirements of 28nm chip.
2, at present, the production of 28nm chips requires lithography machines mainly 40nm and 28nm lithography machines, which have higher resolution, more precise control systems and more efficient processing processes.
No way. 1, because lithography is limited by the principle of optical imaging and the optical medium, its minimum resolution is constrained by the diffraction limit, which is commonly referred to as the diffraction limit.
For a 90nm lithography machine, the minimum resolution can only reach 90nm, and a 28nm chip requires a higher resolution of the lithography machine. 2, in addition, chip manufacturing not only depends on the photoengraving process, but also needs a series of auxiliary processes to mature, such as precision engraving technology, material preparation technology, etc., which have an important impact on the final product of chip manufacturing.
Therefore, it is impossible to produce 28nm chips with only 90nm lithography.
Hello, 90nm lithography machine theoretically cannot produce 28nm chips. First, the minimum feature size of the 28nm process node is much smaller than that of the 90nm process node, requiring a higher level of lithography.
Second, lithography machines, in addition to resolution, require greater stability and denser exposure methods to produce today's chips. Finally, 28nm chips require more sophisticated manufacturing processes and equipment to ensure their quality and reliability.