The difference is that the same wavelength can be divided into different processes.
The wavelength of the lithography machine is roughly divided into five generations, and the current euv and duv are the fifth and fourth generation light source wavelengths, respectively, and their wavelengths are 13.5 nm extreme ultraviolet light source and 192 nm deep ultraviolet light source. The fifth generation 13.5nm light source can currently make chips with a manufacturing process below 22nm. The current mainstream is 4nm, 5nm, 7nm and other processes up to 22nm. The manufacturing process of 192 nanometer light source is also relatively many. In general, the wavelength is fixed, and the process is \"compressed\" by technical means to improve the process.
The smaller the wavelength, the higher the process, but the same light source can be changed in other ways. For example, when the refraction passes through water, the wavelength becomes smaller.
The wavelength of the lithography machine refers to the wavelength of the light source used, such as the EUV ultra violet lithography machine wavelength of 10-14nm.
However, euv lithography machines can lithograph 7nm, 5nm and even 2nm wafers, which is the process.
The optical engraving process can be smaller than the wavelength of the light source using some technical means