The EUVEUV light source prototype can produce chips as small as 7 nanometers.
The reason is that the EUVEUV light source is a new lithography technology with a shorter wavelength than traditional lithography technology, which can better achieve high-precision and high-density micro-machining. At the same time, the technology also has better irradiation stability and lower defect rate, which can play a greater role in chip manufacturing. As a result, the technology can be used to produce chips of even smaller sizes, which are expected to achieve a manufacturing standard of 7 nanometers. In addition, with the continuous progress and innovation of technology, smaller size chip manufacturing standards may appear in the future, and EUVEUV light source technology will continue to upgrade and develop, bringing greater breakthroughs and progress for chip manufacturing.
euv light source prototype can produce chips below 7 nanometers.
Because the light source uses extreme ultraviolet light technology, it can be produced at short wavelengths, and compared with traditional lithography technology, the light source of extreme ultraviolet technology has higher energy and smaller wavelength, and can be more accurate in the production of chips. At the same time, the use of this light source requires strict environmental control and professional operation, so it can only be produced under specific conditions such as laboratories. In addition, the chip produced by the euv light source prototype is not only high in technical content, but also very expensive in production cost, and only a few professional manufacturers have the production capacity at present.