A series of complex process and technical steps are required to manufacture 0.1 nanolithography machines.
First, ultra-high precision photolithographic lenses and photolithographic masks need to be designed and manufactured to ensure extremely small graphic sizes can be achieved.
Second, advanced nanofabrication techniques, such as electron beam or ion beam etching, are needed to create sophisticated lithographic molds.
Finally, the resulting lithography mold needs to be integrated into the lithography machine system to ensure that the graphics can be accurately projected onto the chip. The whole process requires a high degree of engineering precision and technical strength, so manufacturing 0.1 nanolithography is a very challenging task.