Hunan's first lithography machine is an EUV lithography machine put into use in 2019, with a minimum exposure size of 7 nanometers. The lithography machine is a key device in semiconductor manufacturing and is used to project the circuit pattern on the chip onto the silicon wafer. EUV lithography is the most advanced lithography technology that can achieve smaller exposure sizes and improve chip integration and performance. The operation of the first lithography machine in Hunan marks an important breakthrough in the field of semiconductor manufacturing in China and is of great significance for promoting the development of China's semiconductor industry.