The 28-nanometer chips are produced by advanced lithography machines, the most commonly used of which are multiple electron beam lithography (MEB) and extreme ultraviolet lithography (EUV). MEB uses multiple electron beams for simultaneous exposure, enabling high-resolution and high-precision chip fabrication. EUV, on the other hand, uses extreme ultraviolet light sources for exposure, with higher resolution and smaller feature sizes. These lithographers enable precise pattern transfer and highly integrated circuit structures when manufacturing 28nm chips to meet the performance and power requirements of modern electronics.