10000nm (1 micron = 1000nm)
Chip manufacturing process: 10 microns in 1971; (Intel introduces the 4004 processor)
6 microns in 1974;
1978 3 micron (the first G-wire lithography machine DSW4800 in the United States in 1978)
1.5 microns in 1982;
1985 1 micron (the first G-wire lithography machine in China in 1985)
1987 800 nanometers.
600 nm in 1990;
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1993 350 nm;
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1996 250 nm;
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180 nm in 1999;
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130 nm in 2001;
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90 nm in 2003; (Prototype immersive lithography machine TAT: 1150i, jointly manufactured by asml and TSMC)
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65 nm in 2005;
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45nm in 2007; (asml and TSMC joint production version of immersive lithography machine TXT: 1900i)
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32 nm in 2009;
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22 nm in 2012;
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14 nm in 2014; (NXE3300B, asml's first production EUV lithography machine, was delivered in 2013)
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10 nm in 2016;
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7 nm in 2018;
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5 nanometers in 2020.