In 2008, the IC card chip manufactured by Hitachi used a 90-nanometer process, and later will use a 65-nanometer process and a 32-nanometer process. It is estimated that the manufacturing process is now less than 20 nanometers.
Like the second generation ID card, the material of the bank card itself is PETG new material with green environmental protection performance. This new material can be recycled and reused without causing any pollution to the surrounding environment. PETG new material for the second generation ID card is the latest research and development of Jiangsu Huaxin Plastic Industry, has become the second generation ID card base material, and is the only manufacturer in the country. In other words, the main chip technology of the second-generation ID card is domestic, and the card material is also domestic.
In 2008 the chip was 45 nanometers.
The big event in the computer industry in 2008 was the emergence of the 45nm chip. Since the beginning of the year IT giant Intel Corporation released the first batch of 45nm processors based on Intel Centrino processors, our Ben has also swaggered and officially entered the new 45nm era. Intel will release the Menlow platform, which uses a 45-nanometer process that will reduce the power consumption of UMpcs by 10 times and reduce the size by three times.