The main difference between 1980di and 1950di lithography machines is their resolution and range of application.
The 1980di lithography machine can achieve a resolution of 38nm or greater, a numerical aperture of 1.35NA, and can produce 275 wafers per hour. This lithography machine is mainly used to manufacture 14nm and higher levels of chips.
The 1950di lithography machine has a lower resolution of less than 38nm, a numerical aperture of 0.85NA, and can produce 170 wafers per hour. This lithography machine is mainly used to manufacture 90nm and higher grades of chips.
In summary, the difference between 1980di and 1950di lithography machines is mainly reflected in the resolution and scope of application. The former is more suitable for making higher-level chips, while the latter is more suitable for making lower-level chips.