The reason a 28 nanometer (nm) lithography machine can produce a 7 nanometer (nm) chip is that the 28nm lithography machine has enough resolution and accuracy to make smaller chips. The lithography machine is an important device in the semiconductor manufacturing process, which is used to project the chip design pattern onto the silicon chip to form the pattern structure of the chip. The resolution and accuracy of the lithography machine determine the manufacturing capability of the chip.
The resolution and accuracy of the 28nm lithography machine can reach the requirements of the 7nm chip, because the process of making the chip by the lithography mechanism uses more advanced technologies and materials. For example, the use of higher levels of photoresist, higher power lasers, higher resolution lenses and so on. The use of these technologies and materials can improve the resolution and accuracy of the lithography machine, thus enabling the manufacture of smaller chips.
In addition, the 28nm lithography machine can also achieve the manufacture of smaller chips through multiple exposures and multi-layer stacking techniques. These technologies can improve the manufacturing efficiency and reduce the cost of chips on the premise of ensuring the quality of chips. Therefore, the 28nm lithography machine can produce 7nm chips.
The reason why 28nm lithography machines can produce 7nm chips is the resolution of lithography technology and the improvement of multiple exposure technology. By using higher resolution lithography masks and improved exposure techniques, smaller feature sizes can be achieved on 28nm lithography machines.
In addition, multiple exposure technology can be used to stack multiple exposure steps on top of each other to further improve resolution. These technological advances have enabled 28nm lithography machines to produce chips of even smaller sizes, such as 7nm.