Usually with a laser. For example, to etch graphics on glass, the approximate steps are: cleaning the glass, drying, coating the glass with photoresist (that is, the photoresist has positive and negative points), drying (curing), exposure (there are many ways, such as laser direct writing, simultaneous exposure through the mask, etc.), degluing (photochemical changes in the properties of the photoresist after exposure, and there are many ways to degluing. If it is placed in the etching agent and positive adhesive is used, the illuminated area will be dissolved, and the photoresist will remain where it is not illuminated, and the required pattern will be etched on the photoresist here (more methods, such as ion beam bombardment, the photoresist and the glass are simultaneously bombarded, and the exposed glass is also bombarded after the photoresist is bombarded), cleaning, and transfer (more methods, such as ion beam bombardment, the photoresist and the glass are simultaneously bombarded). Transfer the pattern on the photoresist to the glass). In fact, lithography methods and specific steps are quite complex, the environmental requirements are also very high, the above is only the basic steps, let you roughly understand it.
The role of the lithography machine is to etch the functions and lines of the chip, and of course, it also includes the manufacture of large-scale integrated circuits such as processors or memory particles, flash memory particles and so on. Lithography machine is a key equipment for manufacturing MEMS, optoelectronics, and diode large-scale integrated circuits. It can be divided into two types, respectively, the contact aligner of the template and the pattern size, and the template is close to the chip when exposed; And the stepper, which uses a projector-like principle, gets a smaller exposure pattern than the template